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| Title |
451: Systematic study of in-situ boronization |
| Name: | Clement Wong ( ) |
Affiliation: | General Atomics |
| Research Area: | Boundary |
Presentation time: |
Not requested |
Co-Author(s): | D. Rudakov, P. West, N. Ashikawa, K. Holtrop, R. Lee |
| Description: | Systematic study of in-situ boronization, by injecting different mixture of helium and diborane gases, from different DIII-D injectors and under different plasma discharges. The boron coating distribution will be recorded on different graphite buttons on the MiMES and DiMES samples. |
| Experimental Approach/Plan: | Injection of a selected mixture of helium and diborane gas at the last discharge of other already planned dedicated experiment. This would only be requested right before the weekend of boronization, such that any remaining diborane gas in the plasma chamber can be cleared through normal boronization procedure. After boronization study, material samples will be extracted from MiMES and DiMES systems. Special safety procedure will be applied for button samples extraction. Safety procedure of this procedure will also need to be reviewed carefully. |
| Background: | C, Be will not be suitable plasma facing materials for DT steady state operation due to radiation damage. W, the remaining high-Z and low sputtering material could suffer significant damage from helium ions. A boron layer could protect the W surface, due to the small mean free path of helium ions. A systematic study is necessary to understanding the possibility of in-situ boronization, impacts to different plasma operation, coating uniformity, and B-migration in the plasma chamber during different plasma discharges. |
| Resource Requirements: | MiMES and DiMES system, and preparation for boronization from different gas injection locations and during plasma discharges |
| Diagnostic Requirements: | Different chamber wall and divertor diagnostics. |
| Analysis Requirements: | Characterization of coated B layer on graphite buttons will be performed in the US and Japan. |
| Other Requirements: | -- |